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Pure Appl. Chem. Vol. 74, No. 3, pp. 317-509 (2002)

Pure and Applied Chemistry

Vol. 74, Issue 3

Preface*

Selected by the International Organizing Committee, these invited plenary and topical lectures illustrate the significant progress that is taking place in various topics covered by the symposium. The expanding science and technologies concerned with plasma chemistry were evidenced at this conference by a large number of participants (624 from 44 countries).

These selected invited lectures have been really appreciated by the symposium participants, and the speakers are acknowledged for the quality of their talks. The publication of their lectures in this issue of Pure and Applied Chemistry (PAC) was done after peer reviews of manuscripts, and the editors would acknowledge all the authors of their contributions and also the reviewers for their help.

This issue of PAC presents an overview on many areas, from fundamental elementary processes to plasma processing, from experimental research to modeling developments. Recent advances in basic science and applications relevant to thermal plasmas and nonequilibrium atmospheric or low-pressure plasmas are reviewed in plenary lectures, and more specific developments on material and surface processing, gas treatments, biotechnology, light sources, etc. are presented in topical lectures. This overview will offer to scientists, and also R&D engineers, concerned at large by plasma chemistry, useful updated information on the present developments in this area of science and technology.

A. Bouchoule
J.-M. Pouvesle
Symposium Editors

*Lecture presented at the 15th International Symposium on Plasma Chemistry, Orl�ans, France, 9-13 July 2001. Other presentations are presented in this issue, pp. 317�492.

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