Paper based on a presentation at the 16th International Symposium on Plasma Chemistry (ISPC-16), Taormina, Italy, 22-27 June 2003.
>
link to conference
calendar
Preface
The 16th International Symposium on Plasma Chemistry, ISPC-16, was held in Taormina, Italy, 22�27 June 2003, under the sponsorship of the International Union of Pure and Applied Chemistry, IUPAC, and of the International Plasma Chemistry Society, IPCS. It was the third time for ISPC to be held in Italy, after ISPC-2 (Rome, 1975) and ISPC-9 (Pugnochiuso, 1989). ISPC is the most important event on plasmas and plasma-related issues, and it provides an extraordinary forum for exchanging information on this exciting and booming field of science and technology.
The deep impact of the 16th edition of ISPC is clearly evidenced by the following figures: 810 contributions from 44 different countries, spread among 5 plenary, 15 topical invited, and 20 special sessions invited talks; 116 oral contributions; and 654 posters. Side events included an industrial exhibition, a workshop for successful industrial applications, the two �traditional� schools (on low- and high-pressure plasma processing of materials), and a school devoted to plasma technology in microelectronics.
The invited plenary and topical lectures, selected by the International Organizing Committee, are representative of the great progress in the different areas of plasma chemistry: from fundamental processes to materials processing and from microelectronics to environmental concerns. This issue of Pure and Applied Chemistry offers an overview on the recent advances in thermal and nonequilibrium plasmas as well as on more specific developments in plasma diagnostics, biomaterials, microelectronics, plasma spray, polymer treatment, and plasma modeling, as they were offered at ISPC-16 by plenary and topical invited speakers.
R. d'Agostino, P. Favia, F. Fracassi, and F. Palumbo
Conference Editors
[Back to Contents]
International Organizing Committee: R. d�Agostino (Chairman, Italy); F. Arefi-Khonsari (France); G. Bruno (Italy); J. Heberlein (USA); G. Oehrlein (USA); D. K. Otorbaev (Kyrgyz Republic); J. M. Pouvesle (France); K. Tachibana (Japan); A. Vardelle (France); J. Winter (Germany); T. Yoshida (Japan).
Board of Directors of the International Plasma Chemistry Society: S. Girshick (Chairman, USA); J. Winter (Vice Chairman, Germany); R. Boswell (Australia); P. Capezzuto (Italy); X. Chen (China); R d�Agostino (Italy); A. Gicquel (France); D. Graves (USA); J. Heberlein (USA); M. Hrabovsky (Czech Republic); G. Kroesen (Netherlands); J. Mostaghimi (Canada); D. Otorbaev (Kyrgyz Republic); P. Pati�o (Venezuela); B. Potapkin (Russia); T. Sakuta (Japan); K. Tachibana (Japan); M. C. M. van de Sanden (Netherlands); A. Vardelle (France).
Local Organizing Committee: R. d�Agostino (Chairman); P. Capezzuto (Chairman); M. Capitelli (Chairman); P. Favia, F. Fracassi, S. Longo, G. Retto (University of Bari); G. Bruno, M. Cacciatore, G. Cicala, V. Colaprico, G. Colonna, S. De Benedictis, G. Dilecce, M. Losurdo, F. Palumbo (IMIP/CNR, Bari); G. Marletta, O. Puglisi, C. Satriano (University of Catania); V. Colombo (University of Bologna); G. De Santi, G. Ferla, G. Zocchi (STMicroelectronics); F. Rossi (Joint Research Centre, European Commission, Ispra).
