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Pure Appl. Chem. Vol. 74, No. 3, pp. 471-474 (2002)

Pure and Applied Chemistry

Vol. 74, Issue 3

Plasma synthesis of catalytic thin films*

A.-L. Thomann1,**, J. P. Rozenbaum1, P. Brault1, C. Andreazza2, P. Andreazza2, B. Rousseau2, H. Estrade-Szwarckopf2, A. Berthet3, J. C. Bertolini3, F. J. Cadete Santos Aires3, F. Monnet3, C. Mirodatos3, C. Charles4, and R. Boswell4

1GREMI UMR 6606 CNRS, Université d'Orléans BP 6744 ORLEANS Cedex 2, France; 2CRMD, UMR 6619 CNRS, 45067 ORLEANS Cedex 2, France; 3IRC UPR 5401 CNRS, Av. A. Einstein; F-69626 VILLEURBANNE Cedex, France; 4Space Plasma and Plasma Processing, Plasma Research Laboratory, The Australian National University, Canberra ACT 0200, Australia

Abstract: Plasma sputter deposition is introduced in the field of catalyst preparation. It is shown that growth kinetics and morphologies are determined by ion to neutral flux ratio and kinetic energies of sputtered atoms. Catalytic activity of such catalysts compares very well with classical catalysts.

* Lecture presented at the 15th International Symposium on Plasma Chemistry, Orléans, France, 9-13 July 2001. Other presentations are presented in this issue, pp. 317–492.
** Corresponding author.


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