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Pure Appl. Chem. Vol. 74, No. 3, pp. 459-464 (2002)

Pure and Applied Chemistry

Vol. 74, Issue 3

Comparative characterization of high-density plasma reactors using emission spectroscopy from VUV to NIR*

Yi-Kang Pu1,**, Zhi-Gang Guo1, Zheng-De Kang1, Jie Ma1, Zhi-Cheng Guan1, Guang-Yu Zhang2, and En-Ge Wang2

1Department of Electrical Engineering, Tsinghua University, Beijing 100084, China; 2Institute of Physics, Chinese Academy of Sciences, Beijing 100080, China

Abstract: Emission spectroscopy is used to investigate the effect of inert gas mixing in nitrogen plasmas generated in inductively coupled plasma (ICP) and electron cyclotron resonance (ECR) plasma sources. Vacuum ultraviolet (VUV) emission of resonance lines is used to determine concentration of atomic nitrogen while electron temperature is obtained from optical emission spectra. It is found that electron temperature can be either raised or reduced effectively by mixing helium or argon in a nitrogen discharge. Electron-electron collisions and superelastic collisions involving metastable species are key factors in electron temperature tuning.

* Lecture presented at the 15th International Symposium on Plasma Chemistry, Orléans, France, 9-13 July 2001. Other presentations are presented in this issue, pp. 317–492.
** Corresponding author.


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