Comparative characterization of high-density plasma reactors using
emission spectroscopy from VUV to NIR*
Yi-Kang Pu1,**, Zhi-Gang Guo1, Zheng-De Kang1, Jie Ma1, Zhi-Cheng Guan1,
Guang-Yu Zhang2, and En-Ge Wang2
1Department of Electrical Engineering, Tsinghua University,
Beijing 100084, China; 2Institute of Physics, Chinese Academy of Sciences,
Beijing 100080, China
Abstract: Emission spectroscopy is used to investigate the effect
of inert gas mixing in nitrogen plasmas generated in inductively coupled
plasma (ICP) and electron cyclotron resonance (ECR) plasma sources.
Vacuum ultraviolet (VUV) emission of resonance lines is used to determine
concentration of atomic nitrogen while electron temperature is obtained
from optical emission spectra. It is found that electron temperature
can be either raised or reduced effectively by mixing helium or argon
in a nitrogen discharge. Electron-electron collisions and superelastic
collisions involving metastable species are key factors in electron
* Lecture presented at the 15th International Symposium
on Plasma Chemistry, Orléans, France, 9-13 July 2001. Other presentations
are presented in this issue, pp. 317492.
** Corresponding author.
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